MRI: Track # 1 Acquisition of an Atomic Layer Deposition System for Research and Training at Binghamton University

Non-Technical description: Digital devices like smartphones and computers increasingly require smaller, faster, and more reliable components. Atomic layer deposition (ALD) systems help develop these components by coating complex surfaces with ultra-thin, uniform layers, often just a few atoms thick. These coatings improve the performance, safety, and durability of these devices. The acquisition of the ALD system will support research in areas ranging from microelectronics and energy technologies to quantum computing, biomedical devices and sensors. It will also support the institution’s growth in industry collaborations. The team will work with industry to improve technologies that will support the nation’s economic competitiveness. The PI and team will support workforce development by offering courses and micro-credentials for students and industry partners to improve skills and gain research experience. The team will collaborate with New York State’s Master Teacher Program to host workshops and lab tours for middle and high school teachers. Technical description: The project will support the acquisition of a short-cycle-time atomic layer deposition (ALD) system with multiple material-deposition capabilities to advance research in areas such as energy, microelectronics, 2D materials for spintronics, quantum computing, biomedical devices, and sensing. Compared to other deposition techniques, ALD is unique in providing superior conformal coverage and precise control over the composition and thickness of the coated film, due to its layer-by-layer growth and self-limiting reactions. The system to be acquired is capable of coating several materials, including oxides, nitrides and metals, making it versatile for advanced materials development. The system combines fast, highly efficient ALD with user-friendly, generic substrate handling and production-grade instrumentation, control, and user interface. The system is capable of conformal deposition for patterned features with aspect ratios up to 1,000:1 and sustained deposition rates of >10nm/min, while running growth recipes with optimal precursor consumption and a low thermal budget. The team will leverage ALD's capabilities to advance critical research areas, including the incorporation of novel passivation and buffer layers, along with an appropriate encapsulation layer via ALD coating, to significantly enhance the performance and stability of perovskite-based solar cell devices; also enhancing the long-term cyclic performance of cathode and anode materials in rechargeable batteries and further improving non-precious catalysts for low cost green hydrogen generation. The team anticipates applying low-temperature ALD oxides to achieve efficient lead-free solders in electronic devices and to explore the deposition of metals applicable to bioelectronic devices. Additionally, controlled growth of ALD layers will be employed to produce high-performance Nano/Micro-Electro-Mechanical Systems (N/MEMS) devices and uniform, pinhole-free 2D materials for various applications. This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria. NSF Award ID: 2511730 | Program: 01002627DB NSF RESEARCH & RELATED ACTIVIT | Principal Investigator: Tara Dhakal | Institution: SUNY at Binghamton, BINGHAMTON, NY | Award Amount: $805,036 View on NSF Award Search: https://www.nsf.gov/awardsearch/show-award/?AWD_ID=2511730 View on Research.gov: https://www.research.gov/awardapi-service/v1/awards/2511730.html